JPH0642333Y2 - 半導体材料の処理槽 - Google Patents

半導体材料の処理槽

Info

Publication number
JPH0642333Y2
JPH0642333Y2 JP1985107856U JP10785685U JPH0642333Y2 JP H0642333 Y2 JPH0642333 Y2 JP H0642333Y2 JP 1985107856 U JP1985107856 U JP 1985107856U JP 10785685 U JP10785685 U JP 10785685U JP H0642333 Y2 JPH0642333 Y2 JP H0642333Y2
Authority
JP
Japan
Prior art keywords
tank
holes
passage
processing
row
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1985107856U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6217122U (en]
Inventor
征一郎 相合
Original Assignee
黒谷 巌
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 黒谷 巌 filed Critical 黒谷 巌
Priority to JP1985107856U priority Critical patent/JPH0642333Y2/ja
Priority to DE19863623233 priority patent/DE3623233A1/de
Priority to KR1019860005591A priority patent/KR870001648A/ko
Publication of JPS6217122U publication Critical patent/JPS6217122U/ja
Priority to KR2019900012096U priority patent/KR910001932Y1/ko
Application granted granted Critical
Publication of JPH0642333Y2 publication Critical patent/JPH0642333Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C3/00—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material
    • B05C3/02—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material
    • B05C3/09—Apparatus in which the work is brought into contact with a bulk quantity of liquid or other fluent material the work being immersed in the liquid or other fluent material for treating separate articles
    • B05C3/109—Passing liquids or other fluent materials into or through chambers containing stationary articles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP1985107856U 1985-07-15 1985-07-15 半導体材料の処理槽 Expired - Lifetime JPH0642333Y2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1985107856U JPH0642333Y2 (ja) 1985-07-15 1985-07-15 半導体材料の処理槽
DE19863623233 DE3623233A1 (de) 1985-07-15 1986-07-10 Becken zur behandlung von halbleitermaterialien
KR1019860005591A KR870001648A (ko) 1985-07-15 1986-07-11 반도체 재료의 처리조(處理槽)
KR2019900012096U KR910001932Y1 (ko) 1985-07-15 1990-08-10 반도체 재료의 처리조

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985107856U JPH0642333Y2 (ja) 1985-07-15 1985-07-15 半導体材料の処理槽

Publications (2)

Publication Number Publication Date
JPS6217122U JPS6217122U (en]) 1987-02-02
JPH0642333Y2 true JPH0642333Y2 (ja) 1994-11-02

Family

ID=14469797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985107856U Expired - Lifetime JPH0642333Y2 (ja) 1985-07-15 1985-07-15 半導体材料の処理槽

Country Status (3)

Country Link
JP (1) JPH0642333Y2 (en])
KR (2) KR870001648A (en])
DE (1) DE3623233A1 (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050196519A1 (en) * 2004-03-08 2005-09-08 Depuy Products, Inc. Apparatus for producing a biomimetic coating on a medical implant

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1067657B (de) * 1955-08-03 1959-10-22 Schilde Maschb Ag Tauchbehaelter fuer Oberflaechenbehandlung
DE1577685B2 (de) * 1965-08-13 1974-07-04 Duerr, Otto, 7000 Stuttgart Tauchbecken zur Oberflächenbehandlung von Werkstücken, insbesondere zum Lackieren
JPS5452985A (en) * 1977-10-04 1979-04-25 Kyushu Nippon Electric Etching device

Also Published As

Publication number Publication date
JPS6217122U (en]) 1987-02-02
KR870001648A (ko) 1987-03-17
KR910001932Y1 (ko) 1991-03-30
DE3623233A1 (de) 1987-01-15

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